کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7993790 | 1516155 | 2018 | 23 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effects of Li doping on the structural and electrical properties of solution-processed ZnO films for high-performance thin-film transistors
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فلزات و آلیاژها
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
We report the structural and electrical properties of Li-doped ZnO (LZO) films, which are spin-coated via a simple solution process using Zn and Li precursor solutions. The Li doping improves the crystallinity of the ZnO films, and the LZO films exhibit a relatively dense and smooth surface morphology compared to that of the undoped ZnO films. Back-gated LZO thin-film transistors (TFTs) are fabricated onto a heavily p-doped Si substrate with a SiO2 gate dielectric, and operated in enhancement mode. In the case of the LZO TFT with a Li doping concentration of 0.50â¯mol%, the highest field-effect mobility of 5.18â¯cm2â¯Vâ1â¯sâ1 is obtained; the on/off current ratio and subthreshold swing are 107 and 1.2â¯V decâ1, respectively. These results demonstrate that Li doping can effectively modulate the structural and electrical properties of ZnO-based films, facilitating the fabrication of LZO TFTs with enhanced performance.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Alloys and Compounds - Volume 739, 30 March 2018, Pages 41-46
Journal: Journal of Alloys and Compounds - Volume 739, 30 March 2018, Pages 41-46
نویسندگان
Kyuhyun Bang, Gi-Cheol Son, Myungwoo Son, Ji-Hyun Jun, Heeju An, Kwang Hyeon Baik, Jae-Min Myoung, Moon-Ho Ham,