Effects of rapid thermal annealing on interfacial and electrical properties of Gd-doped HfO2 high-k gate dielectrics

Effects of rapid thermal annealing on interfacial and electrical properties of Gd-doped HfO2 high-k gate dielectrics

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Alloys and Compounds - Volume 646, 15 October 2015, Pages 310-314

Rui Ma, Mao Liu, Gang He, Ming Fang, Guoliang Shang, Jiweng Zhang, Xuefei Chen, Juan Gao, Guangtao Fei, Lide Zhang,