The structure, oxygen vacancies and magnetic properties of TiOx (0 < x < 2) synthesized by plasma assisted chemical vapor deposition and reduction

TiO2 thin film was deposited by Plasma Assisted Chemical Vapor Deposition (PECVD), and TiOx (0 < x < 2) thin film was synthesized by plasma assisted reduction. The microstructure and morphology of the thin films were determined by SEM and TEM. The crystallization was characterized by X-ray Diffractometer, and surface chemical states were determined by XPS. The structural fingerprint was observed by Raman Spectroscopy, and the magnetic properties were determined by Vibrating Sample Magnetometer in the magnetic field up to 2 Tesla. The results showed that the plasma reduction can result in oxygen vacancies in TiOx thin film, which could bring large impacts on the magnetic properties of the thin films. A higher concentration of oxygen vacancies resulted in larger ferromagnetic behaviors.