Amazing diffusion depth of ultra-thin hafnium oxide film grown on n-type silicon by lower temperature atomic layer deposition

Amazing diffusion depth of ultra-thin hafnium oxide film grown on n-type silicon by lower temperature atomic layer deposition

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Letters - Volume 169, 15 April 2016, Pages 164-167

Qihai Lu, Rong Huang, Xiaoling Lan, Xiaowei Chi, Chao Lu, Cheng Li, Zhiguo Wu, Jun Li, Genliang Han, Pengxun Yan,