کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
8023754 | 1517539 | 2018 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Ni-B electrodeposits with low B content: Effect of DMAB concentration on the internal stresses and the electrochemical behaviour
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Ni-B coatings with low, increasing amount of Boron have been produced using a Ni sulfamate plating bath with the addition of dimethylaminborane. Coatings' characterization revealed that it is possible to produce crack-free coatings with a B content up to 0.12â¯wt%, with a thickness of about 40-50â¯Î¼m. The introduction of an increasing amount of B changes progressively the coatings microstructure from columnar, to fine fibrous and then to lamellar. The presence of B as interstitial atom in the Ni elementary cell caused an increase of the residual stress, as measured by FIB-DIC method, which change from compressive to tensile as a function of B concentration. The microstructure refinement and the increase of the residual stresses caused a noticeable increase of the microhardness. On the other hand, the resistance to localized corrosion decreased by increasing the B content maybe due to the formation of micro-defects or micro-cracks on the Ni passive layer due to the residual stresses. To confirm this hypothesis, the Ni-B coatings have been annealed at 400â¯Â°C to achieve a complete stress relaxation. The stress relaxation caused a decrease of the hardness and a noticeable increase of the corrosion resistance.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 344, 25 June 2018, Pages 190-196
Journal: Surface and Coatings Technology - Volume 344, 25 June 2018, Pages 190-196
نویسندگان
M. Lekka, R. Offoiach, A. Lanzutti, M.Z. Mughal, M. Sebastiani, E. Bemporad, L. Fedrizzi,