کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
8027872 1517628 2014 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Ellipsometric and XPS characterization of transparent nickel oxide thin films deposited by reactive HiPIMS
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Ellipsometric and XPS characterization of transparent nickel oxide thin films deposited by reactive HiPIMS
چکیده انگلیسی
We have deposited transparent p-type semiconductive NiO thin films by reactive HiPIMS which appeared to be a powerful method to produce thin films exhibiting gradients of chemical compositions and opto-electronic properties. For a fixed amount of oxygen in the discharge (9%), the influence of the pulse duration was investigated. The position of the valence band with respect to the Fermi level was evaluated by X-ray Photoelectron Spectroscopy (XPS), for two different pulse durations, 15 and 30 μs. We have then investigated the dependence of optical properties of NiO films using spectroscopic ellipsometry (1.5-5.0 eV range). Refractive index n, extinction coefficient k, and gap energy of the NiO films were determined with a refractive index gradient decreasing along the film growth direction.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 250, 15 July 2014, Pages 21-25
نویسندگان
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