Numerical optimization of baffles for sputtering optical precision filters

For that purpose the distribution of the particle flow from the cylindrical magnetron as well as the resulting thickness profile for different shaper designs is simulated using Direct Simulation Monte Carlo (DSMC) transport simulation. For comparison, experimentally obtained film thickness profiles are evaluated by spectrophotometry and ellipsometry. The simulation model is used for optimization of the baffle geometry as well as investigation on the role of long term drifts caused by target erosion and mechanical tolerances.