کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
8028087 1517637 2014 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Model based investigation of Ar+ ion damage in DC magnetron sputtering
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Model based investigation of Ar+ ion damage in DC magnetron sputtering
چکیده انگلیسی
Further investigation revealed that the IEDFs' high energy tail correlates with the extent of plasma fluctuations seen at certain process conditions. Several experimental studies in recent years have broached the issue of such plasma fluctuations in magnetron discharges. However, PIC-MC simulation data could provide more detailed insights into cause and effect of this inherent discharge anomaly. Thus, it could be instructively revealed how electric field enhancements accompanying these fluctuations affect the IEDF and generation of high energy ions, respectively.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 241, 25 February 2014, Pages 50-53
نویسندگان
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