Nanocrystalline thin films synthesized from a Ti2AlN compound target by high power impulse magnetron sputtering technique

► Thin films composing of Ti2AlN MAX phase and tetragonal Ti2N phase were synthesized at a low temperature of 450 °C. ► The Ti2AlN-Ti2N films were composed of densely packed fibrous grains. ► The films exhibited high H/E and H3/E2 values. ► The films exhibited excellent oxidation and corrosion resistance.