کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
8039628 1518638 2016 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Pattern evolution during ion beam sputtering; reductionistic view
ترجمه فارسی عنوان
تکامل الگوی در هنگام پرتوهای یونی پرتو؛ نمای کلی
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
چکیده انگلیسی
The development of the ripple pattern during the ion beam sputtering (IBS) is expounded via the evolution of its constituent ripples. For that purpose, we perform numerical simulation of the ripple evolution that is based on Bradley-Harper model and its non-linear extension. The ripples are found to evolve via various well-defined processes such as ripening, averaging, bifurcation and their combinations, depending on their neighboring ripples. Those information on the growth kinetics of each ripple allow the detailed description of the pattern development in real space that the instability argument and the diffraction study both made in k-space cannot provide.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 383, 15 September 2016, Pages 59-64
نویسندگان
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