کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
8044548 | 1518921 | 2018 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Investigating the effect of heat treatment on the diffusion behaviour of xenon implanted in glassy carbon
ترجمه فارسی عنوان
بررسی تأثیر عملیات حرارتی بر رفتار نفوذی زنون کاشته شده در کربن شیشه ای
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
چکیده انگلیسی
The effect of sequential isochronal annealing on the diffusion behavior of implanted xenon in glassy carbon is reported. Glassy carbon substrates were implanted with 200â¯keV xenon ions to a fluence of 1â¯Ãâ¯1016Xe+cmâ2. The sample was annealed in vacuum at temperatures ranging from 300â¯Â°C to 1000â¯Â°C for 5â¯h in steps of 100â¯Â°C. The RBS depth profiles obtained at temperatures above 800â¯Â°C showed that some diffusion occurred. The broadening of the peaks was not accompanied with a loss of the implanted Xe. Microstructural changes in the glassy carbon substrate due to Xe bombardment and annealing were monitored using Raman spectroscopy. The Raman spectrum obtained after xenon bombardment showed that the glassy carbon substrate became amorphized. However, a slight recovery of the glassy carbon structure was noticed after heat treatment. The SEM micrographs of the glassy carbon substrate showed an increase in the surface roughness of the glassy carbon substrate after implantation. The increase in the roughness of the glassy carbon substrate was attributed to the sputtering of the loosely bonded carbon atoms along the polishing marks after implantation and annealing.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 149, March 2018, Pages 74-78
Journal: Vacuum - Volume 149, March 2018, Pages 74-78
نویسندگان
M.Y.A. Ismail, J.B. Malherbe, O.S. Odutemowo, E.G. Njoroge, T.T. Hlatshwayo, M. Mlambo, E. Wendler,