Fabrication and characterization of optical and electrical properties of vanadium doped titanium dioxide nanostructured thin film

In this research, vanadium doped TiO2 (VTO) thin film was deposited on glass substrate using sol–gel dip coating method. The structure, morphology, surface roughness, surface composition, optical and electrical properties of the thin films were investigated by X-ray diffraction, field emission scanning electron microscopy, atomic force microscopy, energy-dispersive X-ray spectroscopy, UV-VIS NIR spectrophotometer and MEGGER resistivity meter, respectively. The X-ray diffraction showed that the VTO thin film had a polycrystalline structure. The optical and electrical results indicated that vanadium addition decreased the band gap of the TiO2 thin film from 3.71 to 3.65 eV and resistivity from 16.7 × 107 to 1.7 × 107 Ωcm.