کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
876264 910832 2011 9 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Metal plasma immersion ion implantation and deposition (MePIIID) on screw-shaped titanium implant: The effects of ion source, ion dose and acceleration voltage on surface chemistry and morphology
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی پزشکی
پیش نمایش صفحه اول مقاله
Metal plasma immersion ion implantation and deposition (MePIIID) on screw-shaped titanium implant: The effects of ion source, ion dose and acceleration voltage on surface chemistry and morphology
چکیده انگلیسی

The present study investigated the effect of metal plasma immersion ion implantation and deposition (MePIIID) process parameters, i.e., plasma sources of magnesium and calcium, ion dose, and acceleration voltage on the surface chemistry and morphology of screw-type titanium implants that have been most widely used for osseointegrated implants. It is found that irrespective of plasma ion source, surface topography and roughness showed no differences at the nanometer level; that atom concentrations increased with ion dose but decreased with acceleration voltage. Data obtained from X-ray photoelectron spectroscopy and auger electron spectroscopy suggested that MePIIID process produces ‘intermixed’ layer of cathodic arc deposition and plasma immersion ion implantation. The MePIIID process may create desired bioactive surface chemistry of dental and orthopaedic implants by tailoring ion and plasma sources and thus enable investigations of the effect of the surface chemistry on bone response.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Medical Engineering & Physics - Volume 33, Issue 6, July 2011, Pages 730–738
نویسندگان
, , , , , , , ,