کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
8955667 | 1646098 | 2018 | 35 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Low-temperature chemical vapor deposition (CVD) of metallic titanium film from a novel precursor
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
The metallic Ti film was successfully deposited on the metal substrates at a temperature as low as 620â¯Â°C by developing a novel TiCl2 precursor of chemical vapor deposition (CVD) from a Ti-TiCl4 system, much lower than 1140â¯Â°C and 1200â¯Â°C reported. This is mainly attributed to the unique sublimation and decomposition of TiCl2 at 620â¯Â°C. Increasing the deposition temperature above the evaporation temperature of 750â¯Â°C accelerated the formation of denser and thicker Ti film. A nearly fully dense Ni-Ti intermetallic film was obtained on the 316â¯L substrate at 800â¯Â°C. This remarkably improves the corrosion resistance of 316â¯L steel, nearly tripled the pitting potential of deposited 316â¯L steel. Meanwhile, the microstructure of the 316â¯L matrix hardly changed, and unexpectedly a strong metallurgical bonding was formed between the deposited layer and substrate due to the minor diffusion of Ni and Fe into Ti film.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 353, 15 November 2018, Pages 18-24
Journal: Surface and Coatings Technology - Volume 353, 15 November 2018, Pages 18-24
نویسندگان
Junjie Guo, Yafeng Yang, Qingshan Zhu, Chuanlin Fan, Pengpeng Lv, Maoqiao Xiang,