کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9567029 | 1388382 | 2005 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Femtosecond pulsed laser ablation of diamond-like carbon films on silicon
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موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Femtosecond pulsed laser ablation of diamond-like carbon films on silicon Femtosecond pulsed laser ablation of diamond-like carbon films on silicon](/preview/png/9567029.png)
چکیده انگلیسی
Femtosecond pulsed laser ablation (Ï = 120 fs, λ = 800 nm, repetition rate = 1 kHz) of thin diamond-like carbon (DLC) films on silicon was conducted in air using a direct focusing technique for estimating ablation threshold and investigating the influence of ablation parameter on the morphological features of ablated regions. The single-pulse ablation threshold estimated by two different methods were Ïth(1) = 2.43 and 2.51 J/cm2. The morphological changes were evaluated by means of scanning electron microscopy. A comparison with picosecond pulsed laser ablation shows lower threshold and reduced collateral thermal damage.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 252, Issue 2, 15 October 2005, Pages 352-357
Journal: Applied Surface Science - Volume 252, Issue 2, 15 October 2005, Pages 352-357
نویسندگان
Y. Dong, H. Sakata, P. Molian,