کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9685058 | 1456221 | 2005 | 14 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Fabrication and characterization of polymeric microfiltration membranes using aperture array lithography
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی شیمی
تصفیه و جداسازی
پیش نمایش صفحه اول مقاله
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چکیده انگلیسی
An ion beam aperture array lithography process was employed to fabricate highly ordered polymeric microfiltration membranes with pores that were nearly cylindrical and uniform in size. In this process, a stencil mask, containing a periodic array of circular openings (the aperture array) was irradiated by a broad beam of energetic (30Â keV) helium ions. The ions passing through the openings exposed a resist on a substrate that was placed in close proximity thereby faithfully replicating the mask pattern. Over one hundred filters with either 200 or 350Â nm diameter pore and pore densities varying from 2.5Â ÃÂ 107 to 4Â ÃÂ 108Â #/cm2 were fabricated during the course of this study. Electron microscopy revealed that they all had highly uniform and equally spaced pores without any that overlapped. Additionally, the coefficient of variation of the pore diameter was less than 7% for all samples investigated revealing a very narrow pore size distribution in these membranes as well as a high degree of control of the lithography process. The effective filtration area of individual membranes manufactured in this study was only 0.25Â cm2. However, we also show that our current manufacturing process can be scaled-up to fabricate larger areas at high throughput by employing larger masks.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Membrane Science - Volume 249, Issues 1â2, 1 March 2005, Pages 193-206
Journal: Journal of Membrane Science - Volume 249, Issues 1â2, 1 March 2005, Pages 193-206
نویسندگان
Keping Han, Wendong Xu, Ariel Ruiz, Paul Ruchhoeft, Shankararaman Chellam,