کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9783120 | 1511869 | 2005 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Influence of spacer layer on InP/InGaAs δ-doped heterojunction bipolar transistors
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
مواد الکترونیکی، نوری و مغناطیسی
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
In this paper, the influence of spacer layers on DC performance of InP/InGaAs δ-doped heterojunction bipolar transistors (HBT's) is investigated by theoretical analysis and experimental results. As compared to previous δ-doped HBT's, the studied device has another left-side InGaAs spacer added between δ-doped sheet and InP emitter layers at base-emitter (B-E) junction. The left-side spacer more effectively helps to maintain the integrity of uniform-doped InP emitter and the quality of interface; reduce the emitter barrier for electrons, decrease the collector-emitter offset voltage, and increases the confinement effect for holes. An analytical model related to the potential spike at B-E junction and base recombination current is developed to demonstrate the transistor performances. Experimentally, transistor performances with a maximum current gain of 455 and a low offset voltage of 55 mV are achieved.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Chemistry and Physics - Volume 91, Issues 2â3, 15 June 2005, Pages 431-436
Journal: Materials Chemistry and Physics - Volume 91, Issues 2â3, 15 June 2005, Pages 431-436
نویسندگان
Jung-Hui Tsai, Yu-Jui Chu,