کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9801355 | 1515480 | 2005 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Fabrication and characterization of Ti-Ni shape memory thin film using Ti/Ni multilayer technique
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
دانش مواد (عمومی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Alloying process and shape memory properties of a Ti/Ni multilayer thin film fabricated by a dual d.c. magnetron sputter-deposition method were investigated, and compared with those of a Ti-Ni amorphous thin film fabricated by an alloy target sputter-deposition method. The multilayer thin film was made by depositing Ti and Ni layers alternately on a SiO2/Si substrate. The Ti and Ni of the Ti/Ni multilayer thin film were crystalline after deposition. Alloying of the Ti/Ni multilayer thin film proceeded in multi steps. Amorphous phase was formed at the interfaces between the Ti and Ni layers by inter-diffusion of the Ti and Ni atoms during heating up to 640Â K. Ni-rich Ti-Ni B2 phase was formed during heating up to 710Â K. During further heating up to 750Â K, the Ni-content of the Ti-Ni B2 phase decreased and Ti2Ni phase was formed. The Ti/Ni multilayer thin film exhibited shape memory effect after heat-treatment at 673Â K where Ti-Ni amorphous thin films were not crystallized. The heat-treated Ti/Ni multilayer thin films exhibited the shape memory effect equivalent to that of the heat-treated Ti-Ni amorphous thin films when the heat-treatment temperature was above 873Â K.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Science and Technology of Advanced Materials - Volume 6, Issue 6, September 2005, Pages 678-683
Journal: Science and Technology of Advanced Materials - Volume 6, Issue 6, September 2005, Pages 678-683
نویسندگان
H. Cho, H.Y. Kim, S. Miyazaki,