کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
9801944 1515736 2005 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Ambient temperature growth of nanocrystalline titanium dioxide thin films
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد دانش مواد (عمومی)
پیش نمایش صفحه اول مقاله
Ambient temperature growth of nanocrystalline titanium dioxide thin films
چکیده انگلیسی
Nanocrystalline titania thin films have been deposited at ambient temperature by Dc magnetron sputtering. The crystallite size in the films varies between 25 and 50 nm as calculated from the X-ray diffraction patterns and is dependent on both oxygen pressure as well as thickness of the films. Significantly even at 100% oxygen in the sputtering gas, films of thickness of the order of 500 nm have been grown starting from the metallic Ti target. Optical constants of the films are strongly dependent on process parameters Atomic force microscopy images indicate that the crystallites form large triangular grains of the order of 70-100 nm.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Solid State Communications - Volume 135, Issues 1–2, July 2005, Pages 7-10
نویسندگان
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