کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9801944 | 1515736 | 2005 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Ambient temperature growth of nanocrystalline titanium dioxide thin films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
دانش مواد (عمومی)
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
Nanocrystalline titania thin films have been deposited at ambient temperature by Dc magnetron sputtering. The crystallite size in the films varies between 25 and 50Â nm as calculated from the X-ray diffraction patterns and is dependent on both oxygen pressure as well as thickness of the films. Significantly even at 100% oxygen in the sputtering gas, films of thickness of the order of 500Â nm have been grown starting from the metallic Ti target. Optical constants of the films are strongly dependent on process parameters Atomic force microscopy images indicate that the crystallites form large triangular grains of the order of 70-100Â nm.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Solid State Communications - Volume 135, Issues 1â2, July 2005, Pages 7-10
Journal: Solid State Communications - Volume 135, Issues 1â2, July 2005, Pages 7-10
نویسندگان
D. Pamu, M. Ghanashyam Krishna, K.C. James Raju, Anil K. Bhatnagar,