کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9803564 | 1516469 | 2005 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Hydrogen storage in the bubbles formed by high-flux ion implantation in thin Al films
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فلزات و آلیاژها
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چکیده انگلیسی
The storage of implanted hydrogen in 2-5 μm thick Al films on stainless steel substrates was investigated in this work. Plasma immersion 1 keV H2+ ion implantation was used to load hydrogen into the Al film. The correlation between the effusion of the implanted hydrogen and the evolution of surface morphology was studied by thermal desorption spectroscopy and scanning electron microscopy. It has been found that as-implanted hydrogen at temperatures below 320 K is associated with defects and is chemically bonded at the grain boundaries of nanocrystallites. At higher temperatures, the released hydrogen is accommodated in bubbles. The major part of hydrogen effuses at â¼630 K and the effusion process is controlled by the migration of hydrogen through the surface oxide layer.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Alloys and Compounds - Volume 398, Issues 1â2, 2 August 2005, Pages 203-207
Journal: Journal of Alloys and Compounds - Volume 398, Issues 1â2, 2 August 2005, Pages 203-207
نویسندگان
D. Milcius, L.L. Pranevicius, C. Templier,