کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9809451 | 1517710 | 2005 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Properties and electrochromic performances of reactively sputtered tungsten oxide films with water as reactive gas
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
A change of water vapour partial pressure from 0 to 4 Pa was carried out in order to prepare sputtered tungsten oxide compounds with various oxygen and hydrogen concentrations. Oxygen, tungsten and hydrogen concentrations were determined by Rutherford Backscattering Spectroscopy (RBS) and by Elastic Recoil Detection (ERD) analysis. Structure of tungsten oxide films was analyzed by X-ray diffraction. At low water vapour partial pressure, the films are crystallized and WO2 and W3O phases were observed. The electrochromic performances of such film/SnO2/glass substrate system were measured and discussed taking into account the influence of the water vapour partial pressure injected into the deposition process on the structure, chemical composition and optical properties of the films.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 200, Issues 1â4, 1 October 2005, Pages 232-235
Journal: Surface and Coatings Technology - Volume 200, Issues 1â4, 1 October 2005, Pages 232-235
نویسندگان
H. Sadiki, J.F. Pierson, C. Rousselot, N. Martin, G. Terwagne,