کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9809472 | 1517710 | 2005 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Kinetics of the thin films transformation Ti/Al multilayerâγ-TiAl
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Ti/Al multilayer thin films with nanometric bilayer thickness (period) were produced by d.c. magnetron sputtering. The kinetics from the Ti/Al nanolayers to the γ-TiAl alloy is established based on differential scanning calorimetry (DSC) and X-ray diffraction (XRD) analyses. The kinetic study shows that the period (λ) influences the formation of the ordered γ-TiAl phase. For λ = 4 and λ = 20 nm the high diffusivity and reactivity lead to the formation of γ-TiAl in a single step that includes the formation of disordered TiAl followed by an ordering process. On the contrary, for a multilayer with 200 nm period the formation of γ-TiAl is preceded by the formation of Al3Ti. In both cases the activation energies (Ea) calculated can be compared with values reported in literature.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 200, Issues 1â4, 1 October 2005, Pages 326-329
Journal: Surface and Coatings Technology - Volume 200, Issues 1â4, 1 October 2005, Pages 326-329
نویسندگان
A.S. Ramos, M.T. Vieira,