کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9809609 | 1517712 | 2005 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Corrosion resistance of nitrogenated amorphous carbon films prepared by facing target sputtering
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Nitrogenated amorphous carbon (a-CNx) films were prepared by facing target sputtering (FTS) technique. The nitrogen content in deposited films determined by X-ray photoelectron spectroscopy (XPS) measurement increases from 0 to 19.6 at.% as N2/Ar ratio varies from 0 to 0.4. Several sets of disks with a layer structure of AlMg substrate/CoCrPtB (30 nm)/a-CNx (2 nm) were prepared for accelerated environmental corrosion test. The corrosion spots on the disks are mainly located in the fourth quadrant in the Pq-Sq 2D histogram. Both the corrosion areas in the third and fourth quadrants have a similar trend, increasing with N content in the overcoats. Other techniques, such as Raman spectroscopy and ellipsometric spectroscopy, were used to characterize the a-CNx films deposited on silicon substrates. As N content increases, the G peak width decreases from 187 to 182 cmâ1, the ID/IG intensity ratio increases from 1.75 to 1.99, and the Tauc optical band gap decreases from 2.1 to 1.4 eV. Both Raman and ellipsometric results indicate that the sp3 fraction of carbon atoms decreases with N content. This fact can result in a loose carbon network, which interprets the increase of corrosion spots on the surface of a-CNx films.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 198, Issues 1â3, 1 August 2005, Pages 437-440
Journal: Surface and Coatings Technology - Volume 198, Issues 1â3, 1 August 2005, Pages 437-440
نویسندگان
J.R. Shi, Y.J. Xu, J. Zhang,