کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9809817 | 1517717 | 2005 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Reactive magnetron sputtering of TiOx films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Reactive magnetron sputtering of TiOx films Reactive magnetron sputtering of TiOx films](/preview/png/9809817.png)
چکیده انگلیسی
This article reports on the hysteresis effect in synthesis of TiOx films prepared by a single magnetron (SM) and dual magnetron (DM), the development of deposition rate aD and elemental and phase composition of these films with increasing partial pressure of oxygen pO2. It was shown that: (1) when a control of the oxygen flow rate ÏO2 is used, a jump decrease in aD occurs at a critical value of ÏO2, which corresponds to a transition from the metallic to the oxide mode of sputtering; (2) TiOx films deposited in the metallic mode are opaque while those deposited in the transition and oxide modes are transparent; (3) TiOx films sputtered in the oxide mode are almost stoichiometric and exhibit a well-crystallized structure when both the SM and DM sputtering system are used; (4) 400-nm-thick films prepared by the SM exhibit an X-ray amorphous structure; and (5) the transparent stoichiometric TiOxâ2 films can be sputtered in the transition mode at a high deposition rate aD TiOxâ2=31.5 nm/min achieving up to 77% of that of the pure Ti film, i.e., aD TiO2=0.77 aD Ti, if the DM with a control of pO2 is used.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 193, Issues 1â3, 1 April 2005, Pages 107-111
Journal: Surface and Coatings Technology - Volume 193, Issues 1â3, 1 April 2005, Pages 107-111
نویسندگان
P. Baroch, J. Musil, J. Vlcek, K.H. Nam, J.G. Han,