کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
9809960 1517720 2005 10 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Effect of Sn ion implantation on electrochemical behavior of zircaloy-4
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Effect of Sn ion implantation on electrochemical behavior of zircaloy-4
چکیده انگلیسی
In order to study the effect of tin ion implantation on the aqueous corrosion behavior of zircaloy-4, specimens were implanted by tin ions with a dose range from 1×1016 to 5×1017 ions/cm2 at an extracted voltage of 40 kV. The valence and element penetration distribution of the surface layer were analyzed by X-ray photoelectron spectroscopy (XPS) and auger electron spectroscopy (AES), respectively. Scanning electron microscopy (SEM) and transmission electron microscopy (TEM) were used to examine the micro-morphology and microstructure of tin-implanted samples. When the dose is 5×1016 ions/cm2 or higher, a large number of small tin balls are produced in the implanted surface. The potentiodynamic polarization measurement was employed to evaluate the aqueous corrosion resistance of zircaloy-4 in a 0.5 M H2SO4 solution. It was found that a significant improvement was achieved in the aqueous corrosion behavior of zircaloy-4 implanted with tin when the dose is 1×1016 ions/cm2. When the dose is higher than 1×1016 ions/cm2, the corrosion resistance of zircaloy-4 implanted with tin ions decreased compared with that of the as-received zircaloy-4. Finally, the mechanism of the corrosion behavior of the tin-implanted zircaloy-4 is discussed.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 190, Issues 2–3, 21 January 2005, Pages 271-280
نویسندگان
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