کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
9829921 1524500 2005 10 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Galvanostatic and potentiostatic deposition of bismuth telluride films from nitric acid solution: effect of chemical and electrochemical parameters
موضوعات مرتبط
مهندسی و علوم پایه فیزیک و نجوم فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
Galvanostatic and potentiostatic deposition of bismuth telluride films from nitric acid solution: effect of chemical and electrochemical parameters
چکیده انگلیسی
Composition modulated Bi2Te3 thin films have been deposited onto stainless-steel substrates using a potentiostatic or a galvanostatic process. The deposition potentials and current densities for different bath compositions and concentrations have been estimated from voltamperometric curves. Solutions with two Bi/Te ratios were studied. Only Bi3+ and HTeO2+ solutions in the volumetric proportion of 1:1 with equimolar solution concentrations of 0.01, 0.015 or 0.02 M allow one to obtain films with an excess or a deficiency of Bi in relation to stoichiometric Bi2Te3 (Bi=40 at%, Te=60 at%) by changing the deposition potential or the current density. The structure and the morphology of films have been studied as a function of the electrolyte concentration and the deposition conditions.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 277, Issues 1–4, 15 April 2005, Pages 274-283
نویسندگان
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