Field and temperature dependence of thermally activated flux flow resistance in Tl2Ba2CaCu2O8 thin films

The field and temperature dependence of thermally activated flux flow (TAFF) resistance in Tl2Ba2CaCu2O8 thin films (one film being c-axis-oriented and the other 20° tilted from c-axis) has been measured. By analyzing the broadening of the resistive transition with the TAFF model, we get the field and temperature dependence of the activation energy Uc(T, H) for flux motion of both pancake and Josephson vortices, which is described by Uc(T, H) = A(1 − t)H−n with A a constant and t=T/Tc′(Tc′≈Tc).