Keywords: 52.77 دلار; 52.40.Hf; 52.65.Pp; 52.65.Yy; 52.77.Bn; Plasma etching; Surface morphology; Simulation; Monte Carlo method;
مقالات ISI 52.77 دلار (ترجمه نشده)
مقالات زیر هنوز به فارسی ترجمه نشده اند.
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The effects of substrate plasma etching on the performance of thin metal films
Keywords: 52.77 دلار; 68.35.bd; 68.35.Ct; 52.77.Bn; 81.65.Cf; 78.66.Bz; 81.15.Dj; Electron-Beam Deposition; Thin Films; Plasma Surface Etching; Surface Structure; Metal Films; Optical Properties; Electrical Properties;
The rubbing supplemented atmospheric plasma process for tunable liquid crystal alignment
Keywords: 52.77 دلار; 61.30.Hn; 61.30.Gd; 52.77.Bn; 81.65.âb; Liquid crystal alignment; Plasma beam alignment; Ion beam alignment; Atmospheric plasma treatment;
The effect of an innovative atmospheric plasma jet treatment on physical and mechanical properties of wool fabrics
Keywords: 52.77 دلار; 52.77.Bn; 81.05.Lg; 82.33.Xj; 89.20.BbAtmospheric plasma; Wool; Tensile strength; Low-stress mechanical properties; Air permeability
Etching and forward transfer of fused silica in solid-phase by femtosecond laser-induced solid etching (LISE)
Keywords: 52.77 دلار; 42.82.Cr; 52.77.Bn; 46.50.+a; 42.62.âb; Femtosecond; Forward transfer; Etching; Fracture; Deposition;
XPS characterisation of plasma treated and zinc oxide coated PET
Keywords: 52.77 دلار; 52.77.Bn; 68.47.Mn; 81.15.Cd; 82.80.Pv; 68.35.Np; PET; Plasma processing and deposition; Zinc oxide; Interface; XPS;
Plasma etching of As2S3 films for optical waveguides
Keywords: 52.77 دلار; 42.70.−a; 52.77.Bn; 85.40.HpPlanar waveguides; Laser deposition; Chalcogenides; Processing
In situ endpoint detection of reactive ion-beam etching of dielectric gratings with an etch-stop layer using downstream mass spectrometry
Keywords: 52.77 دلار; 52.77.Bn; 42.79.Dj; 07.75.+h; 52.70.âm; Endpoint detection; Reactive ion-beam etching; Dielectric gratings; Mass spectrometry;
Effects of microwave plasma treatment on the field emission properties of printed carbon nanotubes/Ag nano-particles films
Keywords: 52.77 دلار; 79.70.+q; 73.63.Fg; 52.77.Bn; Carbon nanotubes; Field emission; Plasma treatment; Ag nano-particles;
Role of reactive gas in atmospheric plasma for cell attachment and proliferation on biocompatible poly É-caprolactone film
Keywords: 52.77 دلار; 52.77.âj; 52.25.âb; 52.40.Hf; 82.33.Xj; 52.77.Bn; Atmospheric plasma; Surface modification; Poly É-caprolactone; Cell proliferation;
Selective dissolution of Agx(As0.33S0.67−ySey)100−x chalcogenide thin films
Keywords: 52.77 دلار; 77.84.Dy; 52.77.Bn; 07.79.LhChemical durability; Composition; Vapor phase deposition; Chalcogenides; Atomic force and scanning tunneling microscopy
Ultrafast laser ablation for restoration of heritage objects
Keywords: 52.77 دلار; 52.38.Mf; 52.77.Bn; 81.65.Cf; Femtosecond laser-matter interaction; Laser ablation; Art restoration; Heritage conservation;
Chemical dry etching of silicon nitride in F2/Ar remote plasmas
Keywords: 52.77 دلار; 52.77.-j; 82.33.Xj; 52.77.Bn; 81.65.CfChemical dry etching; Remote plasma; Silicon nitride; Fluorine gas
Preparation of thin GaAs suspended membranes for gas micro-sensors using plasma etching
Keywords: 52.77 دلار; 52.77.Bn; 81.65.Cf; Micro-machining; RIE; GaAs; AlGaAs; Gas micro-sensor;
The influence of post deposition plasma treatment on SnOx structural properties
Keywords: 52.77 دلار; 78.67.Bf; 78.70.Ck; 81.07.Bc; 52.77.Bn; Tin-oxide; TCO; Hydrogen plasma; Solar cell; GISAXS; XRD; SEM; XPS;
Experimental study of ultra-sharp silicon nano-tips
Keywords: 52.77 دلار; 52.77.Bn; 81.65.Cf; 79.70.+q; 73.22.-f; A. Semiconductors; A. Thin films; B. Nanofabrications; E. Electron emission;
Growth and erosion of amorphous carbon (a-C:H) films by low-temperature laboratory plasmas containing H and N mixtures
Keywords: 52.77 دلار; E0400; F0400; P0500; R0900; S1300; 52.77.Bn; 52.77.Dq; 81.05.Uw; 81.15.Jj; Amorphous films (a-C:D); Chemical erosion (chemical sputtering) co-deposition; Erosion; Deposition (redeposition, erosion, deposition); Ion-surface interaction;
Study of photo-resistance and polyimide strip by atmospheric plasma technology
Keywords: 52.77 دلار; 52.77.Bn; 81.65.CfDielectric barrier discharge; Plasma jet; Surface treatment; Atmospheric pressure plasma
Effects of plasma treatment on microstructure and electron field emission properties of screen-printed carbon nanotube films
Keywords: 52.77 دلار; 73.63.Fg; 52.77.Bn; 79.70.+qCarbon nanotube; Plasma treatment; Field emission; Screen-printing
Study on formation and shape of carbon nanotips depending on ion bombardment
Keywords: 52.77 دلار; 52.77.Bn; 81.07.Bc; 81.15.Gh; Ion bombardment; Carbon nanotips; Chemical vapor deposition;
RF-CF4 plasma surface modification of paper: Chemical evaluation of two sidedness with XPS/ATR-FTIR
Keywords: 52.77 دلار; 81.15.Fg; 52.38.Ph; 52.77.Bn; 52.40 Hx; 82.33.Xj; Plasma; Film deposition; Etching; Plasma surface interaction; Paper; Two sidedness;
Influence of aramid fiber moisture regain during atmospheric plasma treatment on aging of treatment effects on surface wettability and bonding strength to epoxy
Keywords: 52.77 دلار; 52.77.Bn; 92.60.Jq; 33.60.Fy; 81.40.Cd; Aramid fibers; Atmospheric pressure plasma treatment; Moisture regain; XPS; Interfacial shear strength; Aging effect;
Surface functionalisation of polymer nanofibres by sputter coating of titanium dioxide
Keywords: 52.77 دلار; 52.77.Bn; 81.65.Cf; 87.64.Ee; Nanofibres; TiO2; Sputtering; AFM; XRD; XPS; ESEM;
Effects of etchant gas on the formation of carbon nanotip arrays grown by plasma-enhanced hot filament chemical vapor deposition
Keywords: 52.77 دلار; 52.77.Bn; 81.07.Bc; 81.15.Gh; Carbon; Chemical vapor deposition; Ion bombardment; Sputtering;
Study on structure change of carbon nanotubes depending on different reaction gases
Keywords: 52.77 دلار; 52.77.Bn; 81.07.Bc; 81.15.Gh; Structure of carbon nanotubes; Chemical vapor deposition; Nitrogenous gas;
Surface analytical studies of Ar-plasma etching of thin heptadecafluoro-1-decene plasma polymer films
Keywords: 52.77 دلار; 52.77.Bn; 68.55.Jk; Plasma polymer; Plasma etching; Teflon-like films; Morphology; Surface;
The effect of fluorine-based plasma treatment on morphology and chemical surface composition of biocompatible silicone elastomer
Keywords: 52.77 دلار; 52.77.Bn; 68.47.Mn; 79.60; Biocompatible polysiloxane; Silicone elastomer; Dry etching; Fluorine-based plasma; XPS;
Development of chalcogenide glass photoresists for gray scale lithography
Keywords: 52.77 دلار; 61.43.Fs; 52.77.Bn; 81.65.Cf; 66.30.−hDiffusion and transport; Chalcogenides; Laser–matter interactions; Scanning electron microscope; Photoinduced effects
High speed anisotropic etching of Pyrex® for microsystems applications
Keywords: 52.77 دلار; 52.77.Bn; 81.05.Kf; 81.65.CfQuartz; MEMs; Sensors; Oxide glasses; Processing
Surface modification of polymer nanofibres by plasma treatment
Keywords: 52.77 دلار; 52.77.Bn; 81.65.Cf; 87.64.Ee; Nanofibres; Plasma treatment; XPS; AFM; Wetting; ESEM;
Study on the mechanism of self-organized carbon nanotips without catalyst by plasma-enhanced hot filament chemical vapor deposition
Keywords: 52.77 دلار; 52.77.Bn; 81.07.Bc; 81.15.Gh; Plasma; Carbon nanotips; Chemical vapor deposition;
Effects of argon plasma treating on surface morphology and gas ionization property of carbon nanotubes
Keywords: 52.77 دلار; 81.07.De; 79.70.+q; 51.50.+v; 52.77.Bn; Carbon nanotube; Surface treatment; Gas ionization; Argon plasma process;
ECR plasma etching of GaAs in CCl2F2/Ar/O2 discharge and IR studies of the etched surface
Keywords: 52.77 دلار; 52.77.Bn; 81.65.Cf; ECR; Plasma discharges; SEM; Anisotropic etching; Etch rate;
Study of the plasma etching process for low-loss SiO2/Si optical waveguides
Keywords: 52.77 دلار; 42.79.Gn; 52.77.Bn; Etching; Optical waveguides; Silicon oxide; Surface roughness;
Etching characteristics of Pb(Zr,Ti)O3 thin films in Cl2/Ar and CF4/Ar inductively coupled plasmas: effect of gas mixing ratios
Keywords: 52.77 دلار; 52.77.Bn; PZT; Etch rate; Electron temperature; Dissociation; Ion-assisted etching;
Microscale chemical and electrostatic surface patterning of Dow Cyclotene by N2 plasma
Keywords: 52.77 دلار; 52.77.Bn; 68.37.Ps; 68.47.Mn; 81.07.âb; 81.65.Cf; 81.65.âb; AFM; Dow Cyclotene; Microscale chemical and electrostatic patterning; N2 plasma treatment; Surface chemical modification; TOF-S-SIMS; XPS;
Origin, control and elimination of undercut in silicon deep plasma etching in the cryogenic process
Keywords: 52.77 دلار; 52.77.Bn; 81.65.Cf; Silicon etching; Cryogenic; SF6/O2; Undercut; High aspect ratio trenches;