
																
																	Analysis of local segregation of impurities at a silicon melt–crystal interface during crystal growth in transverse magnetic field-applied Czochralski method
																
																
																
															Keywords: 07.05.Tp; 68.08.−p; 81.10.FqA1. Computer simulation; A1. Interfaces; A1. Magnetic fields; A2. Czochralski method; B2. Semiconducting silicon