Computational study on transamination of alkylamides with NH3 during metalorganic chemical vapor deposition of tantalum nitride
Keywords: 82.60.-ثانیه; 31.15.Eâ; 34.50.Lf; 81.05.Je; 81.15.Gh; 82.60.âs; A1. DFT calculation; A1. Transamination; A3. Atomic layer epitaxy; A3. Chemical vapor deposition; B1. Tantalum nitride;