کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10249213 | 49468 | 2005 | 13 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Low pressure chemical vapour deposition of ZnO layers for thin-film solar cells: temperature-induced morphological changes
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی شیمی
کاتالیزور
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Low pressure chemical vapour deposition of ZnO layers for thin-film solar cells: temperature-induced morphological changes Low pressure chemical vapour deposition of ZnO layers for thin-film solar cells: temperature-induced morphological changes](/preview/png/10249213.png)
چکیده انگلیسی
Zinc oxide (ZnO) is now often used as a transparent conductive oxide for contacts in thin-film silicon solar cells. This paper presents a study of ZnO material deposited by the low-pressure chemical vapour deposition technique, in a pressure range below the pressures usually applied for the deposition of this kind of material. A temperature series has been deposited, showing a morphological transition around 150 °C. ZnO samples deposited with temperatures just higher than this transition are constituted of large grains highly oriented along a single crystallographic orientation. These “monocrystals” lead to low resistivity values, showing a clear correlation between the size of the surface grains and the electrical performance of corresponding films. Additionally, these large grains also yield ZnO layers with high transparency and high light-scattering power, specially suitable for solar cell technology based on thin-film silicon.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Solar Energy Materials and Solar Cells - Volume 86, Issue 3, 31 March 2005, Pages 385-397
Journal: Solar Energy Materials and Solar Cells - Volume 86, Issue 3, 31 March 2005, Pages 385-397
نویسندگان
S. Faÿ, U. Kroll, C. Bucher, E. Vallat-Sauvain, A. Shah,