کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10364068 | 871361 | 2005 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Wafer to wafer nano-imprinting lithography with monomer based thermally curable resin
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
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چکیده انگلیسی
Nano-imprinting lithography is one of the most promising key technologies for mass production of devices with nano-sized patterns. It is regarded as a tool for the next generation lithography (NGL). In this study, a thermally curable monomer solution was used for the imprinting process in order to lower imprinting pressure and temperature. A unique pressure vessel type imprinting system was used to imprint patterns as small as 150 nm over a whole 6 in. diameter wafer at a relatively low temperature (80 °C) and pressure (20 atm). Near zero residual layer under the trenches was successfully demonstrated over the whole 6 in. active area.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 77, Issue 2, February 2005, Pages 168-174
Journal: Microelectronic Engineering - Volume 77, Issue 2, February 2005, Pages 168-174
نویسندگان
Heon Lee, Gun-Young Jung,