کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
10364068 871361 2005 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Wafer to wafer nano-imprinting lithography with monomer based thermally curable resin
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Wafer to wafer nano-imprinting lithography with monomer based thermally curable resin
چکیده انگلیسی
Nano-imprinting lithography is one of the most promising key technologies for mass production of devices with nano-sized patterns. It is regarded as a tool for the next generation lithography (NGL). In this study, a thermally curable monomer solution was used for the imprinting process in order to lower imprinting pressure and temperature. A unique pressure vessel type imprinting system was used to imprint patterns as small as 150 nm over a whole 6 in. diameter wafer at a relatively low temperature (80 °C) and pressure (20 atm). Near zero residual layer under the trenches was successfully demonstrated over the whole 6 in. active area.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 77, Issue 2, February 2005, Pages 168-174
نویسندگان
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