کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10364189 | 871506 | 2005 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Full wafer scale near zero residual nano-imprinting lithography using UV curable monomer solution
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
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چکیده انگلیسی
A unique pressure vessel type imprinting system was used to imprint the patterns as small as 150 nm over whole 4-in. diameter wafer with near zero residual layer. To cover the whole surface of 100 mm diameter Si wafer, an array of 18 mm by 18 mm quartz stamps was used as an imprint stamp. UV curable benzylmethacrylate (C11H12O2) based monomer solution is used as an imprinting resin in this study. Near zero residual nano-imprinting over 100 mm diameter Si wafers was successfully demonstrated with 25 atm of imprinting pressure by using liquid state monomer based UV curable resin.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 77, Issue 1, January 2005, Pages 42-47
Journal: Microelectronic Engineering - Volume 77, Issue 1, January 2005, Pages 42-47
نویسندگان
Heon Lee, Gun-Young Jung,