کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
10364787 871819 2005 9 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
A step-and-repeat UV-nanoimprint lithography process using an elementwise patterned stamp
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
A step-and-repeat UV-nanoimprint lithography process using an elementwise patterned stamp
چکیده انگلیسی
Ultraviolet-nanoimprint lithography (UV-NIL) is a promising cost-effective method for defining nanoscale structures at room temperature and low pressure. To apply a large-area stamp to a high throughput step-and-repeat process at atmospheric conditions, we proposed a new UV-NIL process that uses an elementwise patterned stamp (EPS), which consists of elements separated by channels, and additive gas pressurization. The proposed UV-NIL process required just four imprints to press an 8-in. wafer. EPS features measuring 50-80 nm were successfully transferred onto the wafers. The experiments demonstrated that a 5 × 5-in.2 EPS could be used with a step-and-repeat UV-NIL process to imprint 8-in. wafers under atmospheric conditions.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 82, Issue 2, October 2005, Pages 180-188
نویسندگان
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