کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10406974 | 892819 | 2016 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Te implantation in Ge(001) for n-type doping applications
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی برق و الکترونیک
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چکیده انگلیسی
5Ã1015 Te+ ions cmâ2 were implanted in an Ge(001) substrate using an industrial implanter with a Te+ beam energy of 180 keV. In addition to usual implantation-mediated defects observed in Ge with usual dopants, Te implantations lead to the formation of amorphous surface GeO clusters exhibiting micrometer scale sizes, as well as deep extended defects. Implantation defects promote the formation of two distributions of dislocation loops and clusters located at two different depths in the Ge substrate during annealing. No interactions between Te atoms and dislocation loops were observed. However, the formation of non-equilibrium Te-Ge clusters, probably mediated by Ge self-interstitials, was found to prevent the Te solubility to exceed ~5Ã1019 cmâ3 in Ge. The regular implantation method is shown to be ineffective for the production of high level n-type Ge doping using Te, due to the important Ge damage caused by Te implantation.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science in Semiconductor Processing - Volume 42, Part 2, February 2016, Pages 215-218
Journal: Materials Science in Semiconductor Processing - Volume 42, Part 2, February 2016, Pages 215-218
نویسندگان
J. Perrin Toinin, A. Portavoce, K. Hoummada, M. Texier, M. Bertoglio, S. Bernardini, L. Chow,