Photopolymerization of a perfluoropolyether oligomer and photolithographic processes for the fabrication of microfluidic devices

► A perfluoropolyether based photocured polymer is characterized. ► It is highly reactive under irradiation, transparent, chemically and thermally resistant. ► It is a better material with respect to PDMS for microfluidic applications. ► Pattern transfer into the methacrylic fluoropolymer is possible by using a direct photolithographic approach.