کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10624958 | 989613 | 2014 | 19 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Synthesis of negative thermal expansion HfW2O8 thin film using pulsed laser deposition
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
HfW2O8 thin films were grown on quartz substrates using a pulsed-laser deposition method at various temperatures from room temperature to 500 °C and different oxygen pressures from 5 Pa to 20 Pa. The effects of substrate temperatures, oxygen pressures and post-annealing on the phase compositions and morphologies of the obtained HfW2O8 thin films were systematically investigated using X-ray diffraction (XRD) and a field emission scanning electron microscope (FESEM). The thermal expansion properties of the cubic HfW2O8 thin films were characterized using high temperature X-ray diffraction (HTXRD). Results indicate that the as-deposited HfW2O8 thin films show amorphous phases. Crystallized cubic HfW2O8 thin films can be prepared by heating at 1200 °C for 7 min. HfW2O8 thin film grown at 500 °C with an oxygen pressure of 5 Pa displayed the smoothest and uniform surface morphologies. The high temperature X-ray diffraction analyses demonstrate that the cubic HfW2O8 thin film exhibits strong negative thermal expansion and an α to β structure phase transition occurred between 100 °C and 150 °C. Its average linear thermal expansion coefficient was calculated to be â9.33Ã10â6 Kâ1 from 25 °C to 600 °C.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Ceramics International - Volume 40, Issue 9, Part A, November 2014, Pages 13855-13859
Journal: Ceramics International - Volume 40, Issue 9, Part A, November 2014, Pages 13855-13859
نویسندگان
Hongfei Liu, Gang Wang, Zhiping Zhang, Kunmin Pan, Xianghua Zeng,