کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1198217 1492989 2006 8 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
IR laser-induced process for chemical vapor deposition of polyselenocarbosilane films
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی آنالیزی یا شیمی تجزیه
پیش نمایش صفحه اول مقاله
IR laser-induced process for chemical vapor deposition of polyselenocarbosilane films
چکیده انگلیسی
TEA CO2 laser irradiation into gaseous mixtures of 1,3-disilacyclobutane (DSCB) and dimethyl selenide (DMS) results in infrared multiple photon-induced, non-interacting homogeneous decompositions of both educts, one yielding silene (H2SiCH2) and the other elemental selenium as major products. The reaction between polymerizing silene and agglomerizing Se leads to chemical vapor deposition of novel polyselenocarbosilane films which are unstable in atmosphere. The laser induced co-decomposition represents a new process in allowing (i) reaction between thermally generated transient and element and (ii) chemical vapor deposition of the product of this reaction.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Analytical and Applied Pyrolysis - Volume 76, Issues 1–2, June 2006, Pages 178-185
نویسندگان
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