Total reflection X-ray photoelectron spectroscopy as a semiconductor lubricant elemental analysis method

• Hard disk storage media top layer was analyzed by TRXPS.
• Argon etched, burnished, and unburnished samples have been characterized by TRXPS and compared.
• TRXPS only characterized the top layer (about 2 nm) constituents with enhanced sensitivity.
• TRXPS is demonstrated as a reproducible quality control method for HDD top layer chemical analysis.

Photoelectron spectra from a typical hard disk storage media device (HDD) were measured at total reflection and non-total reflection at unburnished, acetone-cleaned, and argon-sputtered conditions. F, O, N, and C usually making the upper layer of a typical hard disk medium were detected. Enhancement of the photoelectron emission of the fluorocarbon lubricant was observed at total reflection. Pt and Co were only found by non-total X-ray photoelectron spectroscopy (XPS) because they are constituents of a deeper region than the top and interface regions. Argon-sputtered, ultrasonic acetone-cleaned, and unburnished top layers were compared at total and non-total reflection conditions. Total reflection X-ray photoelectron spectroscopy (TRXPS) is demonstrated to be a powerful tool for storage media lubrication layer chemical state analysis, reliable for industrial quality control application , and reproducible.