Engineering of molecular architectures of β-diketonate precursors toward new advanced materials

Metal complexes bearing linked hexafluoroacetylacetonates and ancillary Lewis ligands, have found wide interest as precursors for metal-organic chemical vapor deposition (MOCVD) since their first description in 1991. The relationships involving their molecular architectures, mass transport properties, decomposition mechanisms of both alkaline- and rare-earth metal precursors are compared to fluorine-free β-diketonates. The perspectives of applications to MOCVD processes of a large range of advanced materials in thin film forms are discussed in detail. The effects due to the nature of the β-diketonate moiety as well as of the ancillary ligand on mentioned properties are discussed in detail.