Metal–organic chemical vapor deposition of Bi2Mn4O10 films on SrTiO3 〈1 0 0〉

Bi2Mn4O10 films were deposited on SrTiO3 (1 0 0) substrates via metal–organic chemical vapor deposition (MOCVD) from the Bi(phenyl)3 and Mn(tmhd)3 (Htmhd = 2,2,6,6-tetramethyl-3,5-heptanedione) precursors. The films were deposited in the temperature range of 600–800 °C. The X-ray diffraction (XRD) characterization indicates that the Bi2Mn4O10 phase is stable within the investigated range, but the temperature plays a crucial role in determining the out-of-plane orientation of the films. The SEM shows very homogeneous surfaces with a fiber texture morphology at the highest deposition temperature. The AFM data indicate a textured surface with a root mean square roughness of 77.67 nm for films deposited at 800 °C.

Bi2Mn4O10 films were deposited on SrTiO3 (1 0 0) substrates via metal–organic chemical vapor deposition (MOCVD) from the Bi(phenyl)3 and Mn(tmhd)3 (Htmhd = 2,2,6,6-tetramethyl-3,5-heptanedione) precursors.Figure optionsDownload as PowerPoint slide