Microcontact printed poly(amidoamine) dendrimer monolayers on silicon oxide surface

Patterning of silicon substrates with poly(amidoamine) generation 5 (PAMAM-G5) dendrimers using soft lithographic microcontact printing (μCP) is presented. μCP is shown to yield monolayers of dendrimers patterned with high level of definition over μm2 to mm2 areas. The patterns are stable over a period of weeks, which is attributed to the suppressed diffusion of partially charged G5 PAMAM on oxidized silicon. However, the dendrimers studied were shown to be relatively weakly bound to the substrate when subjected to lateral stresses. In aqueous conditions most of the dendrimers desorbed from the substrate.