کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
148553 456419 2013 9 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Degradation of the antiepileptic drug carbamazepine upon different UV-based advanced oxidation processes in water
موضوعات مرتبط
مهندسی و علوم پایه مهندسی شیمی مهندسی شیمی (عمومی)
پیش نمایش صفحه اول مقاله
Degradation of the antiepileptic drug carbamazepine upon different UV-based advanced oxidation processes in water
چکیده انگلیسی

This paper systematically investigated the performance of carbamazepine (CBZ) degradation oxone by UVC (253.7 nm) irradiation in the presence of different common oxidants including peroxymonosulfate (PMS), hydrogen peroxide (H2O2) and persulfate (PS). The influence of oxidant dosage, initial CBZ concentrations, solution pH and coexisting inorganic anions was also evaluated. Results revealed that all the CBZ degradation followed the pseudo-first-order kinetics well. The degradation efficiency of the three UV-based processes was in the order of UV/PS > UV/H2O2 > UV/PMS. The rate of CBZ degradation increased as the oxidant dosage increased and decreased as the initial CBZ concentrations increased. The maximum CBZ degradation occurred at pH 11, 3, 5 in UV/PMS, UV/H2O2 and UV/PS system, respectively. Both Cl− and CO32- can inhibit the CBZ degradation in UV/H2O2 and UV/PS system. However, adding Cl− and CO32- into UV/PMS system can increase CBZ degradation at different degrees. Comprehensively consideration of energy requirements, oxidant costs and affecting factors, UV/PS system was the most efficient and economic process for CBZ degradation and a promising technology for water treatment.


► All the CBZ degradation followed the pseudo-first-order kinetics model.
► The best CBZ degradation can be achieved at different pH in the three oxidation systems.
► Coexisting anions produced different effect on the three oxidation systems.
► Persulfate can be applied as an alternative oxidant in water treatment.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Chemical Engineering Journal - Volume 222, 15 April 2013, Pages 150–158
نویسندگان
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