کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1605880 | 1516216 | 2016 | 6 صفحه PDF | دانلود رایگان |
• The metal micro-pillar arrays were synthesized by Ni electroless deposition.
• The Cu2O absorber layer was electrodeposited on the Ni micro-pillar arrays.
• The micro-pillar arrays decreased minority carrier diffusion length.
• The photocurrent of the micro-pillar array was two times larger that of the plate.
Three-dimensional (3D) metal/cuprous oxide (Cu2O) micro-pillar arrays were fabricated by electroless deposition of Ni on Si micro-pillars followed by the electrochemical deposition of Cu2O on the metal micro-pillars. The metal micro-pillars with heights of 16 μm and diameters of 1–1.5 μm showed low reflectance and conductance values similar to Cu2O plates, indicating that the 3D metal/Cu2O micro-pillars are good current collectors. The photocurrent of the 3D metal/Cu2O micro-pillar arrays was more than twice that of the Cu2O plates. This high photocurrent for the 3D metal/Cu2O micro-pillar results from its large surface area, long optical absorption depth (micro-pillar length) and short carrier diffusion length (thin Cu2O absorber).
Journal: Journal of Alloys and Compounds - Volume 677, 25 August 2016, Pages 66–71