UV assisted photoelectrocatalytic oxidation of phthalic acid using spray deposited Al doped zinc oxide thin films

• Nanostructured undoped and AZO thin films prepared by chemical spray pyrolysis.
• Effect of Al doping on the structural, morphological and photoluminance properties.
• Photocatalytic degradation of phthalic acid under UV light illumination.
• Reaction kinetics and mineralization of phthalic acid.

Undoped and Al doped ZnO (AZO) thin films are successfully prepared by spray pyrolysis technique at optimised substrate temperature of 400 °C onto amorphous and F:SnO2 coated glass substrates. Effect of Al doping on structural, morphological and optical properties of ZnO thin films is studied. Deposited films are polycrystalline with a hexagonal (wurtzite) crystal structure having (0 0 2) preferred orientation. The PEC characterization shows that, short circuit current (Isc) and open circuit voltage (Voc) are (Isc = 0.38 mA and Voc = 421 mV) relatively higher at the 3 at.% Al doping. SEM images show deposited thin films are compact and uniform with seed like grains. All films exhibit average transmittance of about 82% in the visible region and a sharp absorption onset at 375 nm corresponding to 3.3 eV. The photocatalytic activities of the large surface area (64 cm2) Al-doped ZnO photocatalyst samples were evaluated by photoelectrocatalytic degradation of phthalic acid under UV light irradiation. The results show that the 3 at.% AZO thin film photocatalyst exhibited degradation of phthalic acid up to about 45% within 3 h with significant reduction in COD and TOC values.