کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1614901 1516340 2013 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Metal-ion doped p-type TiO2 thin films and their applications for heterojunction devices
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فلزات و آلیاژها
پیش نمایش صفحه اول مقاله
Metal-ion doped p-type TiO2 thin films and their applications for heterojunction devices
چکیده انگلیسی

Our study revealed that wet chemically processed metal-ion (i.e., Al+3, Cr+3, Ni+2) doped TiO2 thin films could convert its conducting nature from n-type to extrinsic p-type. X-ray photoelectron spectroscopy (XPS) showed shifting of valence band edges with increasing doping concentration. The metal-ion doped TiO2 films were employed as active component in bipolar heterojunction devices, which recorded low turn-on voltage and showed rectification behavior. These results were analyzed to conclude that the doped TiO2 is p-type in nature. Temperature-dependent responses of field effect transistors (FETs) with the p-TiO2 films as channel component revealed efficient features. Conclusive results revealed that reliable and reproducible p-type conductivity could be obtained with Ni+2 doped TiO2.


► Solution processed Al+3, Cr+3 and Ni+2 doped TiO2 thin films display p-type conductivity.
► The p-type conductivity was examined through X-ray photoelectron spectroscopy and current–voltage responses.
► The doped thin films were employed as active components in field effect transistor (FET) devices.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Alloys and Compounds - Volume 553, 15 March 2013, Pages 188–193
نویسندگان
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