کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1616372 | 1516375 | 2012 | 5 صفحه PDF | دانلود رایگان |

Copper-doped ZnO films with thickness about 1200 nm were prepared by radio-frequency (RF)-magnetron sputtering on glass substrates. The influence of dopant on the optical properties was investigated using ellipsometry technique. It has been found that only three layer model of surface can be satisfactory fitted with experimental data of ellipsometric measurements obtained in wide range of incident angles. Presence of additional layers within the model can be explained by the interface roughness. The atomic force microscopy (AFM) analysis indicates that thickness of additional layers and value of interface roughness are commensurable. The optical parameters of copper-doped ZnO structures with different concentration of copper dopant were obtained using the fitting procedure within the three-layer model. Absence of copper clusters in the ZnO:Cu layer microstructure was confirmed using X-ray diffraction and the effective media approximation (EMA) analysis. Refractive indices of doped ZnO:Cu layers (n = 2.002…2.04) are very close to the index of ZnO film (n = 1.98) at 632.8 nm. Extinction coefficient increase gradually to (k = 0.002) with the dopant concentration increasing.
► Influence of the copper dopant content on the microstructural evolution and optical properties of ZnO film.
► Absence of metallic clusters inside the film structure.
► Possibility of ellipsometric technique for exploration of similar heterogeneous surface structures.
Journal: Journal of Alloys and Compounds - Volume 518, 25 March 2012, Pages 96–100