کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1620976 1005741 2010 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Study of the size effects in the electrical resistivity of ultrathin (<Cu 40 nm) films in the framework of the statistical conduction models
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فلزات و آلیاژها
پیش نمایش صفحه اول مقاله
Study of the size effects in the electrical resistivity of ultrathin (<Cu 40 nm) films in the framework of the statistical conduction models
چکیده انگلیسی

In their pioneering experimental work, Liu et al. have given the data related to the in situ sheet resistance measurements of polycrystalline ultrathin Cu films, where the resistivity ρ, was determined as a function of film thickness d.The aim of this paper is to show that the size effects in polycrystalline ultrathin Cu films can be easily reinterpreted by using a simple analytical expression of the electrical conductivity, earlier proposed in the framework of the multidimensional conduction models. The electronic transport parameters obtained in this study are in good agreement with our previous theoretical works. For this purpose, the study given by the authors which has been interpreted by using the Namba's model is reconsidered.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Alloys and Compounds - Volume 489, Issue 2, 21 January 2010, Pages 609–613
نویسندگان
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