Ordered nanostructures array fabricated by nanosphere lithography

Ordered PS array was deposited on the silicon substrate and the rigid monolayer formed due to the interconnection by the sodium dodecyl sulfate. Metal film with nanoholes was fabricated by depositing the film onto the PS array. Co nanorings were fabricated in the following Ar ion etching process masked by PS particles. Silicon-based nanoholes were also fabricated by RIE process after the removal of the PS particles by chemical solution. The diameter of PS particle was thinned by the O2 etching process, and thus it is possible to control the diameters of the nanorings and the nanoholes.