Large-area parallel near-field optical nanopatterning of functional materials using microsphere mask

Large-area parallel near-field optical nanopatterning on functional material surfaces was investigated with KrF excimer laser irradiation. A monolayer of silicon dioxide microspheres was self-assembled on the sample surfaces as the processing mask. Nanoholes and nanospots were obtained on silicon surfaces and thin silver films, respectively. The nanopatterning results were affected by the refractive indices of the surrounding media. Near-field optical enhancement beneath the microspheres is the physical origin of nanostructure formation. Theoretical calculation was performed to study the intensity of optical field distributions under the microspheres according to the light scattering model of a sphere on the substrate.